Amorphous fluorocarbon film patents

Thin amorphous fluorocarbon films

Filed: January 22nd, 1999 [Granted]

Patent Number: 6528865

4, 2003 (54) THIN AMORPHOUS FLUOROCARBON FILMS (75) Inventor: Indrajit Banerjee, San Jose, CA (US) (73) Assignee: Intel Corporation, Santa Clara, ...

Method of depositing and amorphous fluorocarbon film using HDP-CVD

Filed: October 10th, 1997 [Granted]

Assignee: Applied Materials Inc

Patent Number: 6211065

Field of the Invention The present invention relates generally to the deposition of an amorphous fluorocarbon film using a high density plasma chemical ...

Fluorocarbon film and method for forming same

Filed: November 9th, 2004 [Pending]

Patent Application Number: 10536774

[0003] An amorphous fluorinated carbon obtained by depositing carbon fluoride gas (hereafter simply referred to as "fluorocarbon film" in this ...

Plasma deposited fluorinated amorphous carbon films

Filed: May 3rd, 1999 [Granted]

Assignee: International Business Machines Corporation

Patent Number: 6150258

1 PLASMA DEPOSITED FLUORINATED AMORPHOUS CARBON FILMS This is ... It is known that the dielectric constant of a fluorocarbon 40 film decreases with ...

Interlevel dielectric stack containing plasma deposited fluorinated ...

Filed: April 29th, 1998 [Granted]

Assignee: Novellus Systems Inc International Business Machines Corporation

Patent Number: 6184572

It is known that the dielectric constant of a fluorocarbon film decreases with ... Fluorinated amorphous carbon films, produced by plasma- enhanced chemical ...

Method for forming low dielectric constant insulating film

Filed: October 10th, 1997 [Granted]

Assignee: LG Semicon Co Ltd

Patent Number: 6043167

1° Another example of a conventional low-dielectric constant, amorphous fluorocarbon film for use as an inter- metallic dielectric is US Pat. No. 5302420.

Chamber seasoning method to improve adhesion of F-containing dielectric film ...

Filed: October 10th, 1997 [Granted]

Assignee: Applied Materials Inc

Patent Number: 6624064

Field of the Invention The present invention relates generally to the deposition of an amorphous fluorocarbon film using a high density 10 plasma chemical ...

Undoped and fluorinated amorphous carbon film as pattern mask for metal etch

Filed: August 2nd, 2002 [Pending]

Assignee: APPLIED MATERIALS INC

Patent Application Number: 10211453

08/948799, filed Oct. 10, 1997, entitled "Method of Depositing An Amorphous Fluorocarbon Film Using HDP-CVD," which is incorporated herein by reference in ...