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Method of depositing and amorphous fluorocarbon film using HDP-CVD
Filed: October 10th, 1997 [Granted]
Assignee: Applied Materials Inc
Patent Number: 6211065
Field of the Invention The present invention relates generally to the deposition of an amorphous fluorocarbon film using a high density plasma chemical ...
Thin amorphous fluorocarbon films
Filed: January 22nd, 1999 [Granted]
Assignee: Intel Corporation
Patent Number: 6528865
The fluorocarbon may include C4F8, C5F8, or C6F6. The hydrocarbon may include CH4, C2H4, C2H2, and C2H6. CxFy ILD films deposited with these combinations of ...
Fluorocarbon film and method for forming same
Filed: November 9th, 2004 [Pending]
Patent Application Number: 10536774
... The present invention relates to an amorphous fluorocarbon film used in the ... between layers and wiring resistance has increased with miniaturization.
Plasma deposited fluorinated amorphous carbon films
Filed: May 3rd, 1999 [Granted]
Patent Number: 6150258
The challenge, then, is to provide a fluorocarbon film as an interlevel dielectric ... 5698901, "SEMICON- 2 DUCTOR DEVICE WITH AMORPHOUS CARBON LAYER FOR ...
Interlevel dielectric stack containing plasma deposited fluorinated ...
Filed: April 29th, 1998 [Granted]
Patent Number: 6184572
It is known that the dielectric constant of a fluorocarbon film decreases with increasing fluorine concentration. (See, for example, S. Takeishi, et al., /.
Method for forming low dielectric constant insulating film
Filed: October 10th, 1997 [Granted]
Assignee: LG Semicon Co Ltd
Patent Number: 6043167
Films with a thickness between 0.05 to 5 fim could be deposited. The hardness and the thermal 20 stability of the amorphous fluorocarbon film stems from the ...
Chamber seasoning method to improve adhesion of F-containing dielectric film ...
Filed: October 10th, 1997 [Granted]
Assignee: Applied Materials Inc
Patent Number: 6624064
Field of the Invention The present invention relates generally to the deposition of an amorphous fluorocarbon film using a high density 10 plasma chemical ...
Undoped and fluorinated amorphous carbon film as pattern mask for metal etch
Filed: August 2nd, 2002 [Pending]
Assignee: APPLIED MATERIALS INC
Patent Application Number: 10211453
08/948799, filed Oct. 10, 1997, entitled "Method of Depositing An Amorphous Fluorocarbon Film Using HDP-CVD," which is incorporated herein by reference in ...
