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Chemical vapor deposition
Chemical vapor deposition
Filed: October 20th, 1977 [Granted]
Patent Number: 4107352
United States Patent m Hakim [ii] 4107352 [45] Aug. 15, 1978 [54] CHEMICAL VAPOR DEPOSITION [75] Inventor: Mohammad Javid Hakim, Burlington, ...
Chemical vapor deposition
Chemical vapor deposition
Filed: September 22nd, 1989 [Granted]
Assignee: Unvala Limited
Patent Number: 4993361
United States Patent [19] Unvala [54] CHEMICAL VAPOR DEPOSITION [75] Inventor: Bhikhu A. Unvala, London, United Kingdom [73] Assignee: Unvala Limited, ...
Chemical vapor deposition
Chemical vapor deposition
Filed: April 9th, 1997 [Granted]
Patent Number: 5871586
Chemical vapor deposition (CVD) method employing wetting pre-treatment
Chemical vapor deposition (CVD) method employing wetting pre-treatment
Filed: April 24th, 2003 [Granted]
Patent Number: 6764927
... CHEMICAL VAPOR DEPOSITION (CVD) METHOD EMPLOYING WETTING PRE- TREATMENT (75) Inventors: Liang-Gi Yao, Hsing-Chu (TW); Ming-Fang Wang, Taichung (TW); ...
Chemical vapor deposition (CVD) of cubic silicon carbide SiC
Chemical vapor deposition (CVD) of cubic silicon carbide SiC
Filed: October 8th, 0146 [Granted]
Patent Number: H28
"Reproducible Preparation of Cubic-SiC Single Crystals by Chemical Vapor Deposition," Shigehiro Ni- shino, Hajime Suhara and Hiroyuki Matsunami, ...
Hot wire chemical vapor deposition (CVD) inline coating tool
Hot wire chemical vapor deposition (CVD) inline coating tool
Filed: August 31st, 2010 [Granted]
Patent Number: 8117987
Chemical vapor deposition (CVD) method and calibration apparatus providing ...
Chemical vapor deposition (CVD) method and calibration apparatus providing ...
Filed: June 11th, 2002 [Pending]
Patent Application Number: 10167607
Field of the Invention [0002] The present invention relates generally to chemical vapor deposition (CVD) methods for forming microelectronic layers within ...
THERMAL GRADIENT ENHANCED CHEMICAL VAPOUR DEPOSITION (TGE-CVD)
THERMAL GRADIENT ENHANCED CHEMICAL VAPOUR DEPOSITION (TGE-CVD)
Filed: November 25th, 2010 [Pending]
Assignee: AIXTRON AG
Patent Application Number: 12954646
[0017] Additional embodiments of the invention provide an apparatus having a chamber configured for chemical vapour deposition of a film on a substrate, ...