Depositing fluorocarbon films on patents

Method for depositing fluorocarbon films on polymer surfaces

Filed: April 27th, 2007 [Granted]

Assignee: The Regents of the University of California

Patent Number: 7879418

1 METHOD FOR DEPOSITING FLUOROCARBON FILMS ON POLYMER SURFACES STATEMENT AS TO RIGHTS TO INVENTIONS 5 MADE UNDER FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT ...

Method for fluorocarbon film depositing

Filed: June 24th, 2002 [Pending]

Patent Application Number: 10178910

These techniques are generally referred to as plasma enhanced chemical vapor deposition (CVD) or (PECVD) procedures. As an example, a fluorocarbon film may ...

Fluorocarbon-organosilicon copolymers and coatings prepared by hot-filament ...

Filed: October 29th, 2002 [Granted]

Assignee: Massachusetts Institute of Technology

Patent Number: 6887578

There still exists a need for a reliable method of depositing fluorocarbon- organosilicon copolymer thin films with well-resolved bonding environments.

Fluorocarbon film and method for forming same

Filed: November 9th, 2004 [Granted]

Assignee: Kyoto University Zeon Corporation

Patent Number: 7648922

3 shows a system diagram showing an example of an apparatus for depositing a fluorocarbon film. In the plasma enhanced chemical vapor deposition apparatus ...

Chemical vapor deposition of fluorocarbon polymer thin films

Filed: March 29th, 1999 [Granted]

Assignee: Massachusetts Institute of Technology

Patent Number: 6156435

A second deposition process is provided by the invention for forming a fluorocarbon polymer thin film having materials properties like that of bulk PTFE.

Method of depositing and amorphous fluorocarbon film using HDP-CVD

Filed: October 10th, 1997 [Granted]

Assignee: Applied Materials Inc

Patent Number: 6211065

More particularly, the present invention relates to a method 10 of depositing an amorphous fluorocarbon film using a high bias power to enhance gap fill ...

Method of forming a fluorocarbon polymer film on a substrate using a ...

Filed: June 24th, 2002 [Pending]

Patent Application Number: 10178795

These techniques are generally referred to as plasma enhanced chemical vapor deposition (CVD) procedures. As an example, a fluorocarbon film may be produced ...

Plasma deposited fluorinated amorphous carbon films

Filed: May 3rd, 1999 [Granted]

Assignee: International Business Machines Corporation

Patent Number: 6150258

One attempt at a polymeric fluorocarbon layer is 50 described in US Pat. No. 5244730, "PLASMA DEPOSITION OF FLUOROCARBON." The fluorocarbon film, prepared ...