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Method for depositing fluorocarbon films on polymer surfaces
Filed: April 27th, 2007 [Granted]
Patent Number: 7879418
1 METHOD FOR DEPOSITING FLUOROCARBON FILMS ON POLYMER SURFACES STATEMENT AS TO RIGHTS TO INVENTIONS 5 MADE UNDER FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT ...
Method for fluorocarbon film depositing
Filed: June 24th, 2002 [Pending]
Patent Application Number: 10178910
These techniques are generally referred to as plasma enhanced chemical vapor deposition (CVD) or (PECVD) procedures. As an example, a fluorocarbon film may ...
Fluorocarbon-organosilicon copolymers and coatings prepared by hot-filament ...
Filed: October 29th, 2002 [Granted]
Assignee: Massachusetts Institute of Technology
Patent Number: 6887578
There still exists a need for a reliable method of depositing fluorocarbon- organosilicon copolymer thin films with well-resolved bonding environments.
Method of depositing and amorphous fluorocarbon film using HDP-CVD
Filed: October 10th, 1997 [Granted]
Assignee: Applied Materials Inc
Patent Number: 6211065
More particularly, the present invention relates to a method 10 of depositing an amorphous fluorocarbon film using a high bias power to enhance gap fill ...
Fluorocarbon film and method for forming same
Filed: November 9th, 2004 [Granted]
Assignee: Kyoto University Zeon Corporation
Patent Number: 7648922
3 shows a system diagram showing an example of an apparatus for depositing a fluorocarbon film. In the plasma enhanced chemical vapor deposition apparatus ...
Plasma deposition of fluorocarbon
Filed: July 9th, 1993 [Granted]
Patent Number: 5302420
The fluorocarbon films as determined by x-ray photoemission spectroscopy have ... On the other hand, films deposited at relatively higher pressure and a low ...
Chemical vapor deposition of fluorocarbon polymer thin films
Filed: March 29th, 1999 [Granted]
Assignee: Massachusetts Institute of Technology
Patent Number: 6156435
Films as thin as a few microns are acceptable for many applications. A second deposition process is provided by the invention for forming a fluorocarbon ...
Thin amorphous fluorocarbon films
Filed: January 22nd, 1999 [Granted]
Assignee: Intel Corporation
Patent Number: 6528865
The fluorocarbon may include C4F8, C5F8, or C6F6. The hydrocarbon may include CH4, C2H4, C2H2, and C2H6. CxFy ILD films deposited with these combinations of ...
