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Electron beam lithography system
Filed: March 26th, 2008 [Granted]
Assignee: NuFlare Technology Inc
Patent Number: 7777205
1 ELECTRON BEAM LITHOGRAPHY SYSTEM CROSS REFERENCE TO RELATED APPLICATIONS 5 This application is based on and claims the benefit of priority from prior ...
Electron beam lithography method
Filed: November 5th, 2003 [Granted]
Assignee: Fuji Photo Film Co Ltd
Patent Number: 7026098
Accordingly, a lithographic area of the electron beam EB per unit time in each element 12a is set constant. Thus, the exposure of the elements 12a can be ...
Electron beam lithography method
Filed: June 30th, 2005 [Pending]
Patent Application Number: 11169575
6 [0066] The disk 11, which is placed on the rotatable stage 41, is formed of silicon, glass or quartz, and has a positive type electron beam lithography ...
Electron beam lithography apparatus
Filed: March 22nd, 2005 [Granted]
Assignee: Pioneer Corporation
Patent Number: 7473910
1 ELECTRON BEAM LITHOGRAPHY APPARATUS TECHNICAL FIELD 5 The present invention relates to an electron beam lithography apparatus for manufacturing an ...
Electron beam lithography method
Filed: July 22nd, 2003 [Granted]
Assignee: Samsung Electronics Co Ltd
Patent Number: 7129024
The electron beam lithography method of claim 2, wherein the scan dose of the electron beam for at least one 5 intermediate step for the extended region of ...
Electron beam lithography apparatus
Filed: September 25th, 1992 [Granted]
Assignee: Hitachi Ltd
Patent Number: 5315123
An electron beam lithography apparatus according to claim 1, wherein said means for calculating a drift characteristic formula calculates the drift ...
Process for electron beam lithography, and electron-optical lithography system
Filed: July 16th, 2001 [Granted]
Assignee: Leo Elektronenmikroskopie
Patent Number: 6657211
Technical Field The invention relates to the combination of two different methods that are used in electron beam lithography, namely electron beam writing ...
Electron beam lithography apparatus and method
Filed: April 24th, 1997 [Granted]
Assignee: Kabushiki Kaisha Toshiba
Patent Number: 5760410
The electron beam lithography apparatus according to claim 9. wherein the exposure dose determination means is means for determining an exposure time of the ...
