Fine pattern formation patents

Method for fine pattern formation

Filed: March 21st, 2002 [Granted]

Patent Number: 6767473

26 is a schematic cross-sectional view showing one embodiment of the apparatus for fine pattern formation according to the present invention; FIG.

Method for fine pattern formation

Filed: August 31st, 2005 [Granted]

Assignee: AZ Electronic Materials USA Corp

Patent Number: 7592132

In a case where the super fine pattern- forming material composition contains the amine compound, 5 it is assumed that this amine compound includes a ...

Method of forming fine pattern

Filed: June 2nd, 2000 [Granted]

Assignee: Semiconductor Leading Edge Technologies Inc ASM Japan K K

Patent Number: 6586163

As a result, the present invention enables formation of a high-precision fine pattern during a lithography step. Preferably, a plasma CVD system is used in ...

METHOD OF FORMING FINE PATTERN

Filed: August 25th, 2006 [Pending]

Assignee: RIKEN

Patent Application Number: 12065246

[0100] Furthermore, according to the inventor(s)' experiment, the contour of the fine pattern formed on the patterning material 202 does not change and ...

Method for forming a fine pattern

Filed: January 17th, 1995 [Granted]

Assignee: Matsushita Electric Industrial Co Ltd

Patent Number: 5518579

As in the first fine-pattern formation method, the fourth fine-pattern formation method can provide an adequate resist pattern with perpendicular sides.

SILICON-CONTAINING COMPOSITION FOR FINE PATTERN FORMATION AND METHOD FOR ...

Filed: September 12th, 2008 [Pending]

Patent Application Number: 12733451

[0025] The composition for fine pattern formation according to the present invention contains the resin dissolved in the solvent.

Fine pattern forming method

Filed: May 1st, 2000 [Granted]

Assignee: Fuji Photo Film Co Ltd

Patent Number: 6497996

10 The second resist layer preferably comprises a pattern forming material which contains a compound having silicon atoms. The content of the silicon atoms ...

Apparatus and method for forming a fine pattern

Filed: May 20th, 1992 [Granted]

Assignee: Mitsubishi Denki Kabushiki Kaisha

Patent Number: 5277740

However, a fine pattern forming technique which utilizes an elastic wave is not known. The present invention involves a fine pattern formation which employs ...