Lithography using phase shift patents

High resolution X-ray lithography using phase shift masks

Filed: September 30th, 1991 [Granted]

Assignee: Wisconsin Alumni Research Foundation

Patent Number: 5187726

1 HIGH RESOLUTION X-RAY LITHOGRAPHY USING PHASE SHIFT MASKS FIELD OF THE INVENTION 5 This invention pertains generally to the field of micro-electronic ...

Method of optical lithography using phase shift masking

Filed: July 18th, 1994 [Granted]

Assignee: Advanced Micro Devices Inc

Patent Number: 5573890

10 15 20 25 30 35 40 45 50 55 60 65 METHOD OF OPTICAL LITHOGRAPHY USING PHASE SHIFT MASKING FIELD OF THE INVENTION The invention relates to a field of ...

Mask for optical lithography using phase shift masking and integrated ...

Filed: August 23rd, 1996 [Granted]

Assignee: Advanced Micro Devices Inc

Patent Number: 5702848

Field of the Invention The invention relates to a field of integrated circuit manufacture using phase shift masking in the optical lithographic patterning ...

Method of phase shift lithography

Filed: May 30th, 1995 [Granted]

Assignee: Micron Technology Inc

Patent Number: 5766829

1 2 METHOD OF PHASE SHIFT LITHOGRAPHY With a chromeless phase shifting reticle, ... intensity at more particularly to photolithography using phase shifting.

Lithography using a new phase-shifting reticle

Filed: March 1st, 1995 [Granted]

Assignee: Intel Corporation

Patent Number: 5633102

US005633102A [ii] Patent Number: [45] Date of Patent: 5633102 May 27, 1997 [54] LITHOGRAPHY USING A NEW PHASE- SHIFTING RETICLE [75] Inventors: Kenny KH Toh ...

Facilitating an adjustable level of phase shifting during an optical ...

Filed: March 8th, 2002 [Granted]

Assignee: Numerical Technologies Inc

Patent Number: 6605481

Terasawa, T, et al., "0.3-Micron Optical Lithography Using a Phase-Shifting Mask ", SPIE, Optical/Laser Microlithog- raphy II, vol. 1088, pp. 25-33, Mar.

Method and apparatus for aerial image improvement in projection lithography ...

Filed: December 21st, 2000 [Pending]

Patent Application Number: 9745676

... image improvement in projection lithography using phase shifting to produce incoherent light to reduce the effects resulting from side maxima formation.

Resolving phase-shift conflicts in layouts using weighted links between ...

Filed: December 5th, 2001 [Granted]

Assignee: Numerical Technologies Inc

Patent Number: 6901575

T, et al., "0.3-Micron Optical Lithography Using a Phase-Shifting Mask", SPIE, Optical/Laser Microlithog- raphy II, vol. 1088, pp. 25-33, Mar. 1989.