... United States Patent im Gallagher 3929587 [45] Dec. 30, 1975 [54] APPARATUS AND METHOD FOR MAINTAINING A STABLE ELECTROLYTE IN OXYGEN ANALYSIS [75] ...

... mass % of the total metallic cobalt content of the freshly reduced catalyst B sample, is contained in J g (x)dx < 0.005 crystallites larger than 15 nm.

IOA Ar 514.5 nm X (nm) FIG.IOB Ar5U.5nm X (nm) FIG.IOC Ar5U.5nm k X (hm) FIG.IIA He-Ne 594.1 nm X (nm) FIG.I2A He-Ne 632.8 nm FIG.IIB He-Ne 594.1 nm X (nm) ...

Re[X] can be determined from an equation: Re[X]=(nx-ny)xd, where nx and ny represent refractive indices of a film (layer) at a wavelength of X nm in a slow ...

A 200 nm thick SiOx was formed as a passivation film 70, ... thickness of the thin-film insertion layer 34 inserted in the free layer 20 were equally x nm.

DS Fiber Dispersion Note: D = SJ4 *(X-XQ 4/X3), S0 = 0.072 ps/nm2.km , X0 = 1 551 nm FIG. ... X (nm) 1355 1356 1357 1358 1359 1360 1361 1362 1363 ...

Anew recursive equation may be obtained that is dependent on a new function (g): x[n\=g{x[nMN\ x[nM-N+l\ . . . , x[«-Ml]} (6) where M is the degree of ...

Re(X) is measured with KOBRA 15 WR (made by Oji Scientific Instruments) as light with a wavelength of X nm is made to strike upon a film in the direction of ...