Optical Compensation Sheet, Polarizing Plate and Liquid Crystal Display
Filed: February 24th, 2006 [Pending]
Patent Application Number: 11816879
Rtfz(546)<1.0 (F) wherein Re (X) is a in-plane retardation (nm) (ie, a retardation in a plane of the optical compensation sheet) at a wavelength of X nm; ...
Magnetoresistance effect element, magnetic head and magnetic reproducing ...
Filed: August 14th, 2002 [Pending]
Patent Application Number: 10217410
In this case, a 100 nm Au film was formed just above the magnetoresistance ... were equally x nm. [0104] FIG. 6 is a graph diagram that shows dependency of ...
XNM - an interface for a network management system
Filed: December 1st, 2004 [Pending]
Patent Application Number: 11002475
1, 2006 (54) XNM - AN INTERFACE FOR A NETWORK MANAGEMENT SYSTEM (75) Inventors: Prakash Chandra, Union City, CA (US); Ajit Parthan, Sunnyvale, ...
Ovd Inspection Method and Inspection Apparatus
Filed: September 6th, 2005 [Pending]
Patent Application Number: 11661936
... wave range not less than 650 [nm] have values not more than a threshold value ... a wavelength X[nm] of the light emitted from said illumination means, ...
Liquid Crystal Display Device, Optical Compensatory Sheet, and Polarizer and ...
Filed: December 28th, 2005 [Pending]
Patent Application Number: 11794355
1 63 and RthsuJX thereof is 0.332 to 0.357 when And/X of the liquid crystal at a wavelength of 650 nm is 0.454, has a low transmittance in the dark state ...
LIQUID-CRYSTAL DISPLAY DEVICE
Filed: June 24th, 2008 [Pending]
Patent Application Number: 12666450
[0029] wherein Re^X) and Re2(X) are Re of the first retardation layer and Re of the second retardation layer, respectively, at a wavelength of X nm measured ...
POLARIZING PLATE AND LIQUID CRYSTAL DISPLAY DEVICE EQUIPPED WITH THE SAME
Filed: March 2nd, 2007 [Pending]
Patent Application Number: 12281577
The Re(X) can be determined by irradiating a light of wavelength X nm along a normal line of a film using KOBRA 21ADH (by Oji Scientific Instrument).
Semiconductor device, its manufacturing method, and sputtering target ...
Filed: March 24th, 2009 [Pending]
Patent Application Number: 12383562
[0116] Mathematical formula 1: x(nm)=k-log(t)+C (1) [0117] In the formula, x denotes the expected thickness (unit: nm) of the barrier layer 7, ...